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Fujifilm will invest approximately INR 800 crore (USD 83 million) to build a semiconductor materials manufacturing facility in India, the company announced on September 16. The greenfield project will be developed in two phases, with investment beginning in October 2026 and commercial production expected to start in fiscal year 2028.
The first phase will focus on front-end process chemicals used in semiconductor manufacturing. The second phase will cover semiconductor surface conditioning materials and high-purity chemicals, with its timing and scale depending on the pace of growth in India’s semiconductor industry and customer demand.
The investment follows a staggered strategy aligned with industry growth, and the project will align with the India Semiconductor Mission (ISM) 2.0 policy, approved by the government in July 2026. India currently has 12 approved semiconductor and display manufacturing units in progress, representing a total investment of about USD 20 billion, with three facilities already producing commercial chips.
The announcement follows a semiconductor roundtable in which Prime Minister Narendra Modi met with global chip executives, including leaders from Intel, Micron and AMD, to discuss India’s semiconductor growth. Fujifilm said it aims to strengthen the country’s front-end semiconductor materials ecosystem and enhance local supply chain resilience through the investment.
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